Abstract: Provided is a method for loading electrode-corroding ingredients into an un-loaded donor gel reservoir of an electrode for an electrically assisted drug delivery system. The method provides that a salt, such as sodium chloride or an organic salt, is provided in the un-loaded donor gel reservoir, contrary to convention. Related electrically assisted drug delivery electrode assemblies also are provided.

Abstract: A reservoir-electrode for an iontophoretic delivery device of the present invention includes an electrode; and a hydrophilic reservoir situated in electrically conductive relation to the electrode. The reservoir is formed from a bibulous hydrophilic cross-linked polymeric material having a substantially uniform concentration of an alkali metal chloride salt therein thereby substantially eliminating concentration gradients of the salt with respect to the electrode. The polymeric material has a first surface and a second surface that is adhesively adherent to the electrode. The first surface of the polymeric material is releasably adhesive to an applied area of a patient's skin.

Abstract: A method for testing the ability of an iontophoretic reservoir-electrode to deliver a medicament includes providing an iontophoretic reservoir-electrode with a contact surface having a shape, a suitable electrical connection and a hydrated bibulous reservoir containing an ionized medicament. The method further includes providing another electrode operating a at preselected polarity opposite to the preselected polarity of the medicament reservoir-electrode. The method further includes providing a separation medium having the property of allowing passage therein to of ions of one charge. The separation medium is positioned between the reservoir electrode with the ionized medicament and the another electrode.

Abstract: Provided is a method for loading electrode-corroding ingredients into an un-loaded donor gel reservoir of an electrode for an electrically assisted drug delivery system. The method provides that a salt, such as sodium chloride or an organic salt, is provided in the un-loaded donor gel reservoir, contrary to convention. Related electrically assisted drug delivery electrode assemblies also are provided.

Abstract: A thermal electrochemical system in which an electrical current is generated between a cathode immersed in a concentrated aqueous solution of phosphoric acid and an anode immersed in a molten salt solution of ammonium phosphate and monohydric ammonium phosphate. Reactants consumed at the electrodes during the electrochemical reaction are thermochemically regenerated and recycled to the electrodes to provide continuous operation of the system.

Abstract: A method of monitoring major constituents within a plating bath. The method involves applying an electrical signal to a working electrode positioned within the plating bath solution, varying signal parameters, and measuring the resultant response signal. The characteristics of the response signal indicate major constituent concentration levels. The method complements and is easily integrated with known voltammetric techniques for analysis of trace constituents, thus forming an integral part of an efficient overall plating bath analysis system. By adjusting major constituent concentration levels in accordance with measurements made using the method of the present invention, a high quality plating bath can be easily and inexpensively maintained.

Abstract: A method and system for monitoring the quality of a phosphate coating on a metal surface having a large surface area. The method comprises applying a current or potential between the metal surface and one or more counter electrodes while they are in the phosphating solution and superimposing a constant ac signal thereon. An ac impedance spectra is obtained by measuring the ac potential between the metal substrate and one or more reference electrodes located between the counter electrode and the substrate. The ac impedance spectra provide an indication of defects in the phosphate coating even when the defects are located within a relatively small region of the total surface area of the metal surface.

Abstract: A method of preconditioning an electrode for use in a plating bath monitoring process. The method involves applying at least one anodic signal to an electrode in contact with the plating bath solution in order to yield a reproducibly clean and stabilized electrode surface, and then applying a plating signal to deposit a layer of metal on the anodically treated electrode. The resultant preconditioned electrode improves the accuracy and precision of subsequent voltammetric monitoring measurements for a variety of different plating baths. The method is easily integrated with and thereby enhances the capabilities of known voltammetric plating bath monitoring processes.

Abstract: A method of monitoring a plating bath which combines ac and dc voltammetry to accurately measure major and trace constituent concentrations. The method involves applying both ac and dc voltammetric signals to a pretreated electrode in contact with the plating bath solution, measuring the ac and dc response current spectra, and comparing the resultant spectra to determine which provides maximum spectral detail for monitoring particular constituents with minimum interference from other constituents. Then, the ac and dc response current spectra are each used to monitor the particular constituents for which each provides the best accuracy. The method complements and is easily integrated with known voltammetric techniques and equipment.

Abstract: A method of monitoring in-tank and on-line metal ion content within a plating bath. The method involves the steps of applying a pretreatment signal to a sensing electrode positioned within the plating bath, applying a sweep signal to the pretreated sensing electrode, and measuring the voltammetric peak current of the resultant response signal. The voltammetric peak current is proportional to the metal ion content of the plating bath. The method complements and is easily integrated with known voltammetric techniques for analysis of trace and major constituents, and is thus an integral part of an efficient overall plating bath analysis system.

Abstract: A method for monitoring the status of a plating bath purification treatment cycle. The method involves applying a swept dc measurement signal to a pretreated electrode which is in contact with the plating solution, and monitoring the resultant response current signal. The electrode potential corresponding to the peak current density in the cathodic sweep of the response current signal provides an accurate indication of the status of the purification treatment cycle. The method tracks the progress of the purification process thereby ensuring the optimal termination points for the treatment process. The method can be used in conjunction with voltammetric plating bath analysis methods and equipment, as part of an overall plating bath monitoring and control system.

Abstract: A method of selectively monitoring particular trace constituents within a plating bath containing multiple trace constituents. The method provides improved selectivity over known voltammetric techniques for certain plating baths and trace constituents. The method involves applying a brief voltammetric plating signal to a pretreated electrode positioned within the plating bath solution, applying a rapid stripping signal to the plated electrode, and monitoring the resultant stripping signal response current. The characteristics of the stripping signal response current indicate the particular trace constituent concentration level. The method complements and is easily integrated with known voltammetric techniques and equipment, and thus improves the efficiency and versatility of existing plating bath analysis systems.

Abstract: A method of forming a reference electrode having a continuously stable reference voltage and particularly well-suited for use in an in-tank electrochemical sensor. The method utilizes an inert substrate and a counter electrode, both immersed in electroplating fluid. Current is passed between the inert substrate and the counter electrode to strip and subsequently replate the inert substrate, which then serves as the reference electrode. The steps of stripping and replating the reference electrode are periodically repeated to maintain the stability of the reference electrode voltage.

Abstract: An electrochemical sensor adapted for use in the electrochemical analysis of liquids. The sensor includes a cell assembly having a liquid flow control chamber, sensing chamber and liquid exit chamber. Liquids to be measured are pumped into the liquid flow control chamber where any turbulence in the liquid is dampened. The non-turbulent liquid is passed from the liquid flow control chamber to the sensing chamber. The sensing chamber includes a working electrode and a counter-electrode. The non-turbulent liquid is passed from the sensing chamber to the liquid exit chamber where it is contacted with a reference electrode. The liquid then exits the sensor. The sensor is well-suited for use in the electrochemical analysis of plating bath solutions where sub-milliampere type AC and DC voltammetric measurements are required in order to generate electrochemical spectra which are indicative of constituents present in the solution.

Abstract: A conductivity sensor adapted for use in the conductimetric analysis of liquids includes a pair of conductivity electrodes incorporated into a conductivity cell assembly having a liquid flow control chamber, sensing chamber, and liquid exit chamber. Liquids to be measured are pumped into the liquid flow control chamber, where any turbulence in the liquid is dampened. The non-turbulent liquid is passed from the liquid flow control chamber to the sensing chamber, where the conductivity of the liquid is determined. The sensing chamber is adapted for changing the height of a column of liquid between the pair of conductivity electrodes in order to vary the cell constant of the sensor. The non-turbulent liquid is passed from the sensing chamber to the liquid exit chamber, where it exits the sensor. The sensor is well-suited for use in measuring conductivities of plating bath solutions and monitoring concentrations of major constituents of plating bath solutions.